Rectangular RF ion source
Medium to large-sized substrates
Ion beam cleaning
Ion beam etching
Ion beam assisted deposition
Product features
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>200 hours
No filament neutralization, long-term continuous operation, easy maintenance
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60x300mm,60x900mm
Rectangular, fully independently developed process special grid, with large-area processing capacity
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Large ion energy beam with high collimation
RF drive, grid, stable and efficient
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Compatible with multiple working gases
Supports oxygen, nitrogen, and hydrogen (other inert gases)
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High process repeatability
Special water cooling and high plasma uniformity
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Accurate and flexible control
Fully independently developed power drive and control system