RF ion source
Assisted deposition
Ion beam etching
Ion beam cleaning
Ion beam sputtering
Product features
-
High ion beam energy
01 -
Accurate and controllable ion beam current
02 -
Low thermal radiation
03 -
Long continuous working hours
04
-
Compatible with multiple working gases
05 -
No pollution to the membrane layer
06
Product advantages
-
Fully independent R&D and manufacturing, non assembly integration
Unique multi-layer grid processing technology, supporting a variety of different shapes and sizes
Radio frequency power supply and controller are independently developed and controllable to ensure optimal performance
-
Adaptive matching, one click ultra-fast start and ultra-high matching efficiency
Fully independently developed ion beam simulation software and ion beam precise measurement system
Multi-scenario and multi-domain process validation with excellent performance indicators


Please scan code to follow us