RF ion source
Assisted deposition
Ion beam etching
Ion beam cleaning
Ion beam sputtering
Product features
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High ion beam energy
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Accurate and controllable ion beam current
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Low thermal radiation
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Long continuous working hours
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Compatible with multiple working gases
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No pollution to the membrane layer
Product advantages
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Fully independent R&D and manufacturing, non assembly integration
Unique multi-layer grid processing technology, supporting a variety of different shapes and sizes
Radio frequency power supply and controller are independently developed and controllable to ensure optimal performance
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Adaptive matching, one click ultra-fast start and ultra-high matching efficiency
Fully independently developed ion beam simulation software and ion beam precise measurement system
Multi-scenario and multi-domain process validation with excellent performance indicators