Ion Beam Sputter Coating Equipment
Laser
Aerospace and defense
Biochemical medicine
Pan-semiconductor
On-board optics
MEMS
Optical communication
Product features
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Optional fully independently developed optical control system
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Dual ion beam + plasma composite deposition system
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Excellent membrane roughness, density, firmness, hardness, etc.
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Film uniformity is controlled within ± 0.5% across the entire workpiece frame range
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Multi sided rotating target material + planetary workpiece disk structure
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Fully independently developed intelligent control software system
Product mix
Process application
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High damage resistance and strong laser film
Multi-bandpass narrowband filter
Ultra-hard and ultra-smooth film
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Flexible transparent conductive film
Ultra-low reflection film
Ultra-dense composite functional film