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IBDTEC Yuheng series

Ion Beam Etching Equipment

The nanoscale physical etching equipment solution using fully independently developed RF ion sources is suitable for etching special structural morphologies of various materials, with high collimation, precision, and reliability. It supports customized development for customers based on different application scenarios.
Direction of application:

MEMS

Thin film circuit

DOE diffraction components

Large area grating

Photonic integrated devices

Special micro/nano structures

Video introduction

Product features

  • Independently developed and controllable RF ion source

    01

  • Compatible with IBE and RIBE

    02

  • Unrestricted working gas

    03

  • Suitable for various difficult-to-process materials

    04

  • High uniformity and repeatability

    05

  • Large area micro-nano structure

    06

Main configurations

Product brochure

application area

grating
AR optical waveguide
Photonic integrated devices
Special micro/nano devices

Online Consultant

Contact Us

13318278059

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离子束微纳加工
核心部件、整机装备与工艺方案
高性能离子源/离子束镀膜/离子束刻蚀/
离子束表面处理
  • 核心部件全自主可控
  • 全新系统架构
  • 工艺融合集成
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Provider of ion beam
micro/nano processing equipment and process solutions
High performance ion source/ion beam coating/
ion beam etching/ion beam surface treatment
  • independent research and development
  • Process integration
  • Customized services
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If you have any questions or needs, please feel free to contact us

  • Customized services
  • Pre-sales and after-sales services
  • Maintenance services
  • Emergency services
  • Equipment upgrade and renovation services
Contact us

Provider of ion beam micro/nano processing equipment and process solutions

High performance ion source/ion beam coating/ion beam etching/
ion beam surface treatment

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Official consultation hotline

13318278059

E-mail: Market@ibdtec.cn

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